Plasma Technology for Advanced Devices

28th International Symposium on Dry Process (DPS 2006)
November 29-30, 2006
Will Aichi (Women’s Center in Aichi Pref.), Nagoya, Japan

Dry processes are the state of the art technologies leading the way through ultra-high performance in microelectronic devices.  The DPS provides for 27 years a valuable forum of discussions on science and technology of new developments in this field.  Present 28th symposium is to be held in Nagoya, Japan, again in conjunction with Korean organizations as the last symposium.  A special issue of an international journal is planed besides the Extended Abstracts. Further information will be announced later.  The DPS Organizing Committee invites you to the conference and welcomes the submission of your papers.

Sponsored by:
The Institute of Electrical Engineers of Japan

Co-Sponsored by:
The Japan Society of Applied Physics

In conjunction with (including Societies under reqeuest) :
The Institute of Electronics, Information and Communication Engineers
The Electrochemical Society of Japan, Electrochemical Society Japan Chapter
The 21st Century COE “Plasma -Nano”(Nagoya Univ., Japan)
The Korean Institute of Surface Engineering
The Korean Vacuum Society
Center for Advanced Plasma Surface Technology (Sungkyunkwan Univ., Korea)                      

General Topics and Arranged Sessions
Theme: Dry processes and related technologies from fundamentals to applications

Mechanisms of plasma-induced surface reactions
Diagnostics and monitoring of plasmas and reaction surfaces
Damages induced by photon-, electron-, and ion-irradiation onto surface
Surface reactions of wet process (cleaning, CMP, electroplating)
Process technologies for etching, CVD and surface treatment
Dry process for low-k, high-k, and new materials
MEMS technologies
Process technologies for flat panel display (LCD, PDP, Organic ELD)
Nano technologies and bio-applications
Environmental technologies
Equipment technology for dry processes
New dry process concept (microplasmas, atmospheric plasmas, etc)

Arranged Sessions:
Precise Dimension Control for Sub-65 nm Node Era: CD control, LER, profile control, Si loss

Submission of Extended Abtracts:
Two page (A4) camera-ready abstract, including figures and references, should be submitted electronically by July 24, 2006.  For furher details on this process please keep in touch with the official website of the conference:  After the reviewing process, authors will be notified of acceptance or rejection of their abstracts by September 20, 2006. Based on scientific quality the IOC will select about 25 papers for oral presentation.  Accepted contributions will appear on the DPS 2006 Extended Abstract.

Invited Speakers [Some proposals for invited talks below are tentative]:

R. Gottscho (Lam Research)

Arranged Session:                            
P. Lazzeri (ITC-irst),
C. Shaunee (IMEC)

Process technologies:
H. Matsuzawa (SONY)

E. Aydil (Univ. Minnesota)

Low-k, high-k:            
N.C. Fuller (IBM)

Flat Panel Display (FPD) processes:
E. H. Choi (Kwangwoon Univ.)


Secretariat -DPS 2006
The 21st Center of Excellence "Plasma-Nano", Nagoya University, Japan
Fax: +81(Japan) 52 788 6702 E-mail:

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